ƒvƒ‰ƒYƒ}ƒGƒŒƒNƒgƒ�ƒjƒNƒX�Ü (Plasma Electronics Award)�@Žó�ÜŽÒ‚Ì�Љî�i2003”N�`�j
‘æ23‰ñ�i20024”N“x�j
˜_•¶ Žó�ÜŽÒ“`•óˆêŽ÷�C‰Á“¡‘å‹P�C�¼ŒG�³–¾�i“Œ‹žƒGƒŒƒNƒgƒ�ƒ“ ƒeƒNƒmƒ�ƒW�[ƒ\ƒŠƒ…�[ƒVƒ‡ƒ“ƒY�j ˜_•¶–¼Extension of ion-neutral reactive collision model DNT+ to polar molecules based on average dipole orientation theory ŽGŽ�–¼Journal of Vacuum Science and Technology A 42, 053002 (2024). ’˜ŽÒ–¼Kazuki Denpoh, Taiki Kato, Masaaki Matsukuma
‘æ22‰ñ�i2023”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ‹v•Ûˆä�M�s�A�¼’J�O�N�A’C–¤“N–ç�A�¬—Ñ�³Ž¡�A”‹–{Œ«�Æ�AŠâŒ³—E�l�iƒ\ƒj�[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…�[ƒVƒ‡ƒ“ƒY�j ˜_•¶–¼Modeling and simulation of coverage and film properties in deposition process on large-scale pattern using statistical ensemble method ŽGŽ�–¼Jpn. J. Appl. Phys. 62, Sl1006 (2023). ’˜ŽÒ–¼Nobuyuki Kuboi, Hiroyasu Matsugai, Tetsuya Tatsumi, Shoji Kobayashi, Yoshiya Hagimoto, and Hayato Iwamoto ˜_•¶�m2�n
Žó�ÜŽÒ“à“c‹Vˆê˜Y�i–¼�é‘å�j�A‰v–{�K‘×�i–¼�é‘å�j�A�åŒ´Š²�l�i–¼�é‘å�j�A’rç³—R”üŽq�i–¼�é‘å�j�A�¬–ì�WŽŸ˜Y�i‹ã�B‘å�j�AŒÃŠÕˆêŒ›�i‹ã�B‘å�j�A�¬àV—²�O�i‘å�ã‘å�j ˜_•¶–¼Single-step fabrication of fibrous Si/Sn composite nanowire anodes by high-pressure He plasma sputtering for high-capacity Li-ion batteries ŽGŽ�–¼Sci. Rep. 13, 14280 (2023). ’˜ŽÒ–¼Giichiro Uchida, Kodai Masumoto, Mikito Sakakibara, Yumiko Ikebe, Shinjiro Ono, Kazunori Koga, Takahiro Kozawa
‘æ21‰ñ�i2022”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ�¬’rŒ’�A�@‰ª‹Ï�AŽ›“ˆ˜a•v�AˆÉ“¡�„�m�i“Œ‹ž‘åŠw�j ˜_•¶–¼Electric-Field-Induced Coherent Anti-Stokes Raman Scattering of Hydrogen Molecules in Visible Region for Sensitive Field Measurement ŽGŽ�–¼Physical Review Letters 129, 033202 (2022). ’˜ŽÒ–¼Takeru Koike, Hitoshi Muneoka, Kazuo Terashima, and Tsuyohito Ito ˜_•¶�m2�n
Žó�ÜŽÒŽs�ìŒi‘¾�i–¼ŒÃ‰®‘åŠw�j�CManh Hung Chu�i“ú–{ƒGƒAƒŠƒL�[ƒh�j�C�XŽR�½�iƒLƒIƒNƒVƒA�j�C—é–Ø—z���i–¼ŒÃ‰®‘åŠw�j�C”Ñ–ì‘å‹P�iƒLƒIƒNƒVƒA�j�C•Ÿ�…—T”V�iƒLƒIƒNƒVƒA�j�CŒIŒ´ˆê�²�iƒLƒIƒNƒVƒA�j�C–L“c�_�F�i–¼ŒÃ‰®‘åŠw�j ˜_•¶–¼Angular Distribution Measurement of High-Energy Argon Neutral and Ion in A 13.56 MHz Capacitively-Coupled Plasma ŽGŽ�–¼Applied Physics Express 14, 126001 (2021). ’˜ŽÒ–¼Keita Ichikawa, Manh Hung Chu, Makoto Moriyama, Naoya Nakahara, Haruka Suzuki, Daiki Iino, Hiroyuki Fukumizu, Kazuaki Kurihara, and Hirotaka Toyoda
‘æ20‰ñ�i2021”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ‘å�¼ �L�iƒŒ�[ƒU�[ƒeƒbƒNДޮ‰ïŽÐ�j�AŽR�è •¶“¿�iŽO•H“d‹@Дޮ‰ïŽÐ�j�A ” �è Šì˜Y�i“ŒŽÅƒGƒlƒ‹ƒM�[ƒVƒXƒeƒ€Š”Ž®‰ïŽÐ�j�A ’|‘º �«�¹Ž÷�A�ª’à “Ä�A�Ô’Ë —m�i“Œ‹ž�H‹Æ‘åŠw�j ˜_•¶–¼Measurement of electron temperature and density of atmospheric-pressure non-equilibrium argon plasma examined with optical emission spectroscopy ŽGŽ�–¼Japanese Journal of Applied Physics 60, 026002 (2021) ’˜ŽÒ–¼Hiroshi Onishi, Fuminori Yamazaki, Yoshiro Hakozaki, Masaki Takemura, Atsushi Nezu, and Hiroshi Akatsuka ˜_•¶�m2�n
Žó�ÜŽÒ�²�X–Ø �‘¾�A�‚“‡ Œ\‰î�A‹àŽq �r˜Y�i“Œ–k‘åŠw�j ˜_•¶–¼Portable Plasma Device for Electric N2O5 Production from Air ŽGŽ�–¼Industrial & Engineering Chemistry Research 60, 798-801 (2021) ’˜ŽÒ–¼Shota Sasaki, Keisuke Takashima, and Toshiro Kaneko
‘æ19‰ñ�i2020”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ‹à �Ú�_�A”Š_ �G’m�A�å“c ‘n�iŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š�j ˜_•¶–¼Low-Temperature Graphene Growth by Forced Convection of Plasma-Excited Radicals ŽGŽ�–¼Nano Letters 19, 739 (2019) ’˜ŽÒ–¼Jaeho Kim, Hajime Sakakita, and Hiromoto Itagaki ˜_•¶�m2�n
Žó�ÜŽÒ�²“¡ �D�O�AŽÄ“c ‘��iƒpƒiƒ\ƒjƒbƒNДޮ‰ïŽÐ�j�A�è•” Œpˆê˜Y�A�]—˜Œû �_“ñ�i‹ž“s‘åŠw�j ˜_•¶–¼Evaluation of residual defects created by plasma exposure of Si substrates using vertical and lateral pn junctions ŽGŽ�–¼Journal of Vacuum Science and Technology B38, 012205 (2020) ’˜ŽÒ–¼Yoshihiro Sato, Satoshi Shibata, Keiichiro Urabe, and Koji Eriguchi
‘æ18‰ñ�i2019”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ‹v•Ûˆä�M�s�iƒ\ƒj�[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…�[ƒVƒ‡ƒ“ƒYДޮ‰ïŽÐ�j�A’C–¤“N–ç�iƒ\ƒj�[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…�[ƒVƒ‡ƒ“ƒYДޮ‰ïŽÐ�j�A�¬’¬ ���AŽR�ì�^–í�iƒ\ƒj�[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…�[ƒVƒ‡ƒ“ƒYДޮ‰ïŽÐ�j ˜_•¶–¼Insights into different etching properties of continuous wave and atomic layer etching processes for SiO2 and Si3N4 films using voxel-slab mode ŽGŽ�–¼Journal of Vacuum Science & Technology A 37, 051004 (2019) ’˜ŽÒ–¼Nobuyuki Kuboi, Tetsuya Tatsumi, Jun Komachi, and Shinya Yamakawa ˜_•¶�m2�n
Žó�܎ґ呺Œõ�L�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�A‹´–{“Õˆê�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�A‘«—§�V‘ñ�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�A‹ß“¡—S‰î�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�A�Î�ì�Ÿ˜N�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�Aˆ¢•”�~Žq�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�AŽðˆäˆÉ“sŽq�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�A—Ñ ‹v‹M�iƒLƒIƒNƒVƒAДޮ‰ïŽÐ�j�AŠÖ�ª �½�i–¼ŒÃ‰®‘åŠw�j�A–x �Ÿ�i–¼ŒÃ‰®‘åŠw�j ˜_•¶–¼Formation mechanism of sidewall striation in high-aspect-ratio hole etching ŽGŽ�–¼Japanese Journal of Applied Physics 58, SEEB02 (2019) ’˜ŽÒ–¼itsuhiro Omura, Junichi Hashimoto, Takahiro Adachi, Yusuke Kondo, Masao Ishikawa, Junko Abe, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine, and Masaru Hori
‘æ17‰ñ�i2018”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ•z‘º �³‘¾�iŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š�j�A�â“c Œ÷�iŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š�j�A�¼Œ´ �_Ži�iŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š�j ˜_•¶–¼Plasma-Induced Electronic Defects: Generation and Annihilation Kinetics in Hydrogenated Amorphous Silicon ŽGŽ�–¼Physical Review Applied, 10, 054006 (2018) ’˜ŽÒ–¼Shota Nunomura, Isao Sakata, and Koji Matsubara ˜_•¶�m2�n
Žó�܎ґ呺 Œõ�L�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j�AŒÃ–{ ˆê�m�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j�A�¼“c ˜a‹v�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j�A�²�X–Ø �r�s�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j�AŽðˆä ˆÉ“sŽq�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j�A—Ñ ‹v‹M�i“ŒŽÅƒ�ƒ‚ƒŠ(Š”)�j ˜_•¶–¼Layer-by-layer etching of LaAlSiOx ŽGŽ�–¼Plasma Sources Science and Technology, 26, 065015 (2017) ’˜ŽÒ–¼Mitsuhiro Omura, Kazuhito Furumoto, Kazuhisa Matsuda, Toshiyuki Sasaki, Itsuko Sakai and Hisataka Hayashi
‘æ16‰ñ�i2017”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ�¼ŽR �C•ã�i–kŠC“¹‘åŠw�j�A’†–ì Ž¡‹v�iŠj—Z�‡‰ÈŠwŒ¤‹†�Š�j�AŒã“¡ ŠîŽu�iŠj—Z�‡‰ÈŠwŒ¤‹†�Š�j�A�²�X–Ø �_ˆê�i–kŠC“¹‘åŠw�j ˜_•¶–¼Stark spectroscopy at Balmer-ƒ¿ line of atomic hydrogen for measuring sheath electric field in a hydrogen plasma ŽGŽ�–¼Journal of Physics D: Applied Physics, 50, 234003 (2017) ’˜ŽÒ–¼Shusuke Nishiyama, Haruhisa Nakano, Motoshi Goto, and Koichi Sasaki ˜_•¶�m2�n
Žó�ÜŽÒ•x“c Œ’‘¾˜Y�i‹ã�B‘åŠw�j�A�²“¡ —S‘¾�i‹ã�B‘åŠw�j�A’zŽR �»ˆê�i‹ã�B‘åŠw�j�A�]Œû Žõ–¾�i‹ã�B‘åŠw�j�A“à–ì Šìˆê˜Y�i‹ã�B‘åŠw�j�A�_‰Æ �Kˆê˜Y�iƒMƒKƒtƒHƒgƒ“Дޮ‰ïŽÐ�j�AŒËŽº Œ[–¾�iƒMƒKƒtƒHƒgƒ“Дޮ‰ïŽÐ�j�A�aŒû Œv�iƒMƒKƒtƒHƒgƒ“Дޮ‰ïŽÐ�j�A�»Œ´ �~�iPurdue ‘åŠw�j�A�¼Œ´ Œ÷�C�i‘å�ã‘åŠw�j ˜_•¶–¼Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources ŽGŽ�–¼Scientific Reports, 7, 12328 (2017) ’˜ŽÒ–¼Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, Toshiaki Eguchi, Kiichiro Uchino, Kouichiro Kouge, Hiroaki Tomuro, Tatsuya Yanagida, Yasunori Wada, Masahito Kunishima, Georg Soumagne, Takeshi Kodama, Hakaru Mizoguchi, Atsushi Sunahara, and Katsunobu Nishihara
‘æ15‰ñ�i2016”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ™Z‹Ê ’¼�l�i‹à‘ò‘åŠw�j�A“c’† �N‹K�i‹à‘ò‘åŠw�j�A–k Œ’‘¾˜Y�i’†•”“d—Í�j�A�ã�™ Šì•F�i‹à‘ò‘åŠw�j�A�Γ‡ ’B•v�i‹à‘ò‘åŠw�j�A“nç² Žü�i“ú�´�»•²ƒOƒ‹�[ƒv–{ŽÐ�j�A’†‘º Œ\‘¾˜Y�i“ú�´�»•²ƒOƒ‹�[ƒv–{ŽÐ�j ˜_•¶–¼A method for large-scale synthesis of Al-doped TiO2 nanopowder using pulse-modulated induction thermal plasmas with time-controlled feedstock feeding ŽGŽ�–¼Journal of Physics D: Appl. Phys., 47,195304 (2014) ’˜ŽÒ–¼Naoto Kodama, Yasunori Tanaka,Kentaro Kita, Yoshihiko Uesugi,Tatsuo Ishijima, Shu Watanabe and Keitaro Nakamura ˜_•¶�m2�n
Žó�ÜŽÒ�²�X–Ø �‘¾�i“Œ–k‘åŠw�j�A�_�è “W�i“Œ–k‘åŠw�j�A‹àŽq �r˜Y�i“Œ–k‘åŠw�j ˜_•¶–¼Calcium influx through TRP channels induced by short-lived reactive species in plasma-irradiated solution ŽGŽ�–¼Scientific Reports, 6, 25728 (2016) ’˜ŽÒ–¼Shota Sasaki, Makoto Kanzaki and Toshiro Kaneko ‘æ14‰ñ�i2015”N“x�j
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Žó�܎ҔŠ_ “Þ•ä (‹ã�B‘åŠw)�A�¼“‡ �Gˆê (‹ã�B‘åŠw)�AŽR‰º ‘å•ã (‹ã�B‘åŠw)�A�™ çé—Y (‹ã�B‘åŠw)�AŒÃŠÕ ˆêŒ› (‹ã�B‘åŠw)�A”’’J �³Ž¡ (‹ã�B‘åŠw) ˜_•¶–¼Synthesis and Characterization of ZnInON Semiconductor: a ZnO-based Compound with Tunable Band Gap ŽGŽ�–¼Materials Research Express 1, 036405 (2014) ’˜ŽÒ–¼Naho Itagaki, Koichi Matsushima, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, and Masaharu Shiratani ˜_•¶�m2�n
Žó�ÜŽÒ‹T“‡ �îŒá (“Œ‹ž�H‹Æ‘åŠw)�A“c‘º šõŽu˜N (“Œ‹ž�H‹Æ‘åŠw)�A�΋´ —T‘¾˜Y�i“ú�´�»•²(Š”)�j�A–ì�è ’q—m (“Œ‹ž�H‹Æ‘åŠw) ˜_•¶–¼Pulsed dry methane reforming in plasma-enhanced catalytic reaction ŽGŽ�–¼Catalysis Today, 256, 67 (2015) ’˜ŽÒ–¼Seigo Kameshima, Keishiro Tamura, Yutaro Ishibashi, and Tomohiro Nozaki
‘æ13‰ñ�i2014”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ–{ŠÔ Œ[ˆê˜Y�i–{“c‹ZŒ¤�H‹Æ�j�C�_Œ´ �~�i“Œ‹ž‘åŠw�j ˜_•¶–¼High throughput production of nanocomposite SiO2 powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries ŽGŽ�–¼Sci. Technol. Adv. Mater., 15, 025006 (2014) ’˜ŽÒ–¼Keiichiro Homma, Makoto Kambara and Toyonobu Yoshida ˜_•¶�m2�n
Žó�ÜŽÒ‹v•Ûˆä �M�s�iƒ\ƒj�[�iŠ”�j�j�C’C–¤ “N–ç�iƒ\ƒj�[�iŠ”�j�j�C�[‘ò �³‰i�iƒ\ƒj�[�iŠ”�j�j�C–؉º —²�iƒ\ƒj�[�iŠ”�j�j�C�¬’¬ ���iƒ\ƒj�[�iŠ”�j�j�CˆÀâV ‹v�_�iƒ\ƒj�[�iŠ”�j�j ˜_•¶–¼Effect of open area ratio and pattern structure on fluctuations in critical dimension and Si recess ŽGŽ�–¼J. Vac. Sci. Technol., A31, 061304 (2013) ’˜ŽÒ–¼Nobuyuki Kuboi, Tetsuya Tatsumi, Masanaga Fukasawa, Takashi Kinoshita, Jun Komachi, Hisahiro Ansai and Hiroyuki Miwa
‘æ12‰ñ�i2013”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ‰Á“¡�rŒ°�i“Œ–k‘åŠw�j�C”©ŽR—ÍŽO�i“Œ–k‘åŠw�j ˜_•¶–¼Site- and alignment-controlled growth of graphene nanoribbons from nickel nanobars ŽGŽ�–¼Nature Nanotechnol. 7, 651 (2012) ’˜ŽÒ–¼T. Kato and R. Hatakeyama ˜_•¶�m2�n
Žó�ÜŽÒ‹v•Ûˆä�M�s�iƒ\ƒj�[�iŠ”�j�j�C’C–¤“N–ç�iƒ\ƒj�[�iŠ”�j�j�C�¬—Ñ�³Ž¡�iƒ\ƒj�[�iŠ”�j�j�C–؉º—²�iƒ\ƒj�[�iŠ”�j�j�C�¬’¬���iƒ\ƒj�[�iŠ”�j�j�C�[‘ò�³‰i�iƒ\ƒj�[�iŠ”�j�j�CˆÀ�Ö‹v�_�iƒ\ƒj�[�iŠ”�j�j ˜_•¶–¼Modeling and simulation of plasmainduced damage distribution during hole etching of SiO2 over Si substrate by fluorocarbon plasma ŽGŽ�–¼Appl. Phys. Express, 5, 126201 (2012) ’˜ŽÒ–¼N. Kuboi, T. Tatsumi, S. Kobayashi, T. Kinoshita, J. Komachi, M. Fukasawa and H. Ansai
‘æ11‰ñ�i2012”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ�Î�ì Œ’Ž¡(–¼ŒÃ‰®‘åŠw)�C˜hŒ©’¼–ç(“Œ–MƒKƒX)�C‰Í–ì �º•F(‹à‘ò�H‹Æ‘åŠw)�C–xç² ‰p•v(‹à‘ò�H‹Æ‘åŠw)�C’|“c Œ\Œá(–¼ŒÃ‰®‘åŠw)�C‹ß“¡ ”ŽŠî(–¼ŒÃ‰®‘åŠw)�CŠÖ�ª �½(–¼ŒÃ‰®‘åŠw)�C–x �Ÿ(–¼ŒÃ‰®‘åŠw) ˜_•¶–¼Synergistic Formation of Radicals by Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real-time in situ Electron Spin Resonance Study ŽGŽ�–¼J. Phys. Chem. Lett. 2, 1278-1281 (2011) ’˜ŽÒ–¼Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori ˜_•¶�m2�n
Žó�܎҈ɓ¡ ’qŽq(‘å�ã‘åŠw)�C“‚‹´ ˆê�_(‘å�ã‘åŠw)�C�[‘ò �³‰i(ƒ\ƒj�[(Š”))�C’C–¤ “N–ç(ƒ\ƒj�[(Š”))�C•lŒû ’qŽu(‘å�ã‘åŠw) ˜_•¶–¼Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion ŽGŽ�–¼Jpn. J. Appl. Phys. 50, 08KD02 (5pp) (2011) ’˜ŽÒ–¼Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, and Satoshi Hamaguchi
‘æ10‰ñ�i2011”N“x�j
˜_•¶ Žó�ÜŽÒæâ�@‰n �i‰Í“ì”_‹Æ‘åŠw�A’†�‘�j�C‰¬–ì�@–¾‹v �i�ɪ‘åŠw�j�C‰i’Ã�@‰ë�Í �i�ɪ‘åŠw�j ˜_•¶–¼Effects of N2-O2 Gas Mixture Ratio on Microorganism Inactivation in Low-�@Pressure Surface Wave Plasma ŽGŽ�–¼Japanese Journal of Applied Physics 50 (2011) 08JF05 ’˜ŽÒ–¼Ying Zhao, Akihisa Ogino, and Masaaki Nagatsu
‘æ‚X‰ñ�i2010”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ’‡‘ºŒb‰E�iŽO•H“d‹@�j�Cà_“c‘å•ã(P&GƒWƒƒƒpƒ“)�C�ã“c‹`–@(�ì�è�d�H)�C�]—˜Œû�_“ñ�i‹ž“s‘åŠw�j�C•€�‚ˆê�i‹ž“s‘åŠw�j ˜_•¶–¼Selective Etching of High-k Dielectric HfO2 Films over Si in BCl3-Containing Plasmas without rf Biasing ŽGŽ�–¼Applied Physics Express 2, 016503 (2009) ’˜ŽÒ–¼K. Nakamura, D. Hamada, Y. Ueda, K. Eriguchi and K. Ono ˜_•¶�m2�n
Žó�ÜŽÒ“à“c‹Vˆê˜Y�i‹ã�B‘åŠw�j�C“à“c—@�iŽñ“s‘åŠw“Œ‹ž�j�C�HŽR—˜�K�iŽŸ�¢‘ãPDPŠJ”ƒZƒ“ƒ^�[�j�C
Š�ŽR”ŽŽi�i�L“‡‘åŠw�j�CŽÂ“c™B(�L“‡‘åŠw) ˜_•¶–¼Effect of high Xe-concentration in a plasma display panel with a SrCaO cold cathode ŽGŽ�–¼Journal of Applied Physics 107, 103311 (2010) ’˜ŽÒ–¼G. Uchida, S. Uchida, T. Akiyama, H. Kajiyama and T. Shinoda
‘æ‚W‰ñ�i2009”N“x�j
˜_•¶ Žó�ÜŽÒ�w“à˜ÅèÁ�i“Œ–k‘åŠw�j�C�Ü“c•q�K�iOKIƒZƒ~ƒRƒ“ƒ_ƒNƒ^‹{�é�j�C‹´–{���i“Œ‹žƒGƒŒƒNƒgƒ�ƒ“‹Z�pŒ¤‹†�Š�j�C
Žs‹´—R�¬�iŽO—m“d‹@�j�C‘å’|�_�l�i“Œ–k‘åŠw�j�CЦ�ì�½“ñ�i“Œ–k‘åŠw�j ˜_•¶–¼On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process ŽGŽ�–¼Journal of Vacuum Science and Technology, Vol. B25, No. 6, (2007) pp. 1808-1813 ’˜ŽÒ–¼B. Jinnai, T. Orita, M. Konishi, J. Hashimoto, Y. Ichihashi, A. Nishitani, S. Kadomura,, H. Ohtake, S. Samukawa
‘æ‚V‰ñ�i2008”N“x�j
˜_•¶�m1�n
Žó�ÜŽÒ”©ŽR—ÍŽO(“Œ–k‘åŠw)�C‹àŽq�r˜Y(“Œ–k‘åŠw)�C—›‰i•ô(“Œ–k‘åŠw)�C‰Á“¡�rŒ°(“Œ–k‘åŠw)�C”n�ê˜a•F(“Œ–k‘åŠw)�C‰ª“cŒ’(“Œ–k‘åŠw) ˜_•¶–¼Single-stranded DNA insertion into single-walled carbon nanotube by ion irradiation in an electrolyte plasma ŽGŽ�–¼Japanese Journal of Applied Physics, 45 (2006) 8335-8339. ’˜ŽÒ–¼T. Okada, T. Kaneko, R. Hatakeyama ˜_•¶�m2�n
˜_•¶–¼Novel-structured carbon nanotubes creation by nanoscopic plasma control ŽGŽ�–¼Plasma Sources Science and Technology 17 (2008) 024009 (11 pages) ’˜ŽÒ–¼R. Hatakeyama, T. Kaneko, W. Oohara, Y. F. Li, T. Kato, K. Baba, J. Shishido ‘æ‚U‰ñ�i2007”N“x�j
˜_•¶ Žó�ÜŽÒŽ›“ˆ˜a•v(“Œ‹ž‘åŠw)�C☋��‚–¾(“Œ‹ž‘åŠw)�C•Е½Œ¤(“Œ‹ž‘åŠw)�C‹v•Û�G�ä(“Œ‹ž‘åŠw)�C�´�…’õŽ÷(ŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š)�C�²�X–Ø‹B(ŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š)�C‰z�è’¼�l(ŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š) ˜_•¶–¼Carbon materials syntheses using dielectric barrier discharge microplasma in supercritical carbon dioxide environments ŽGŽ�–¼The Journal of Supercritical Fluids 41 (2007) 404-411. ’˜ŽÒ–¼Takaaki Tomai, Ken Katahira, Hirotake Kubo, Yoshiki Shimizu, Takeshi Sasaki, Naoto Koshizaki, Kazuo Terashima ‘æ‚T‰ñ�i2006”N“x�j
˜_•¶ Žó�ÜŽÒ�@‹{‹Å�i–¼ŒÃ‰®‘åŠw�j, –L“c�_�F�i–¼ŒÃ‰®‘åŠw�j, –x“c–F•F�i–¼ŒÃ‰®‘åŠw�j, �›ˆä�G˜Y�i–¼ŒÃ‰®‘åŠw, Œ»�@’†•”‘åŠw�j ˜_•¶–¼Suppression of oxygen impurity incorporation into silicon films prepared from surface-wave excited H2/SiH4 plasma ŽGŽ�–¼Japanese Journal of Applied Physics, 43 (2004) 7696-7700. ’˜ŽÒ–¼S. Somiya, H. Toyoda, Y. Hotta, H. Sugai ‘æ‚S‰ñ�i2005”N“x�j
˜_•¶ Žó�ÜŽÒŽðˆä�@“¹�i‹ž“s‘åŠw�j�C�âŒû‘ñ�¶�i‹ž“s‘åŠw�j�CˆÉ“¡—z‰î�i‹ž“s‘åŠw�j�C‹k�@–M‰p�i‹ž“s‘åŠw�j ˜_•¶–¼Interaction and control of millimeter-waves with microplasma arrays ŽGŽ�–¼Plasma Physics and Controlled Fusion, Vol. 47 (2005) B617-B627. ’˜ŽÒ–¼O.Sakai, T. Sakaguchi, Y. Ito and K. Tachibana ‘æ‚R‰ñ�i2004”N“x�j
˜_•¶�m1�n
Žó�܎ҌÊՈꌛ�i‹ã�B‘åŠw�j�C�b”㊲‰p�iŽO—m“d‹@�j�C”’’J�³Ž¡�i‹ã�B‘åŠw�j�C“n•Ó�ª•v�i‹ã�B‘åŠw�j�CŽ’J�¸�i•Ÿ‰ª�H‹Æ‘åŠw�j ˜_•¶–¼Cluster-suppressed plasma chemical vapor deposition metbod for high quality hydrogenated amorphous silicon films ŽGŽ�–¼Japanese Journal of Applied Physics, Vol. 41(2002) pp.L168-L170 (Express Letters) ’˜ŽÒ–¼Kazunori Koga, Motohide Kai, Masaharu Shiratani, Yukio Watanabe (Kyushu University); Noboru Shikatani (Fukuoka Institute of Technology) ˜_•¶�m2�n
Žó�ÜŽÒ”ª–ØàV‘ì�iŒcœä‹`�m‘åŠw�j�C‘O�d˜a�L�iˆ®�ÉŽq�j�C“‡“c‘ì�iŒcœä‹`�m‘åŠw�j�C�^•Ç—˜–¾�iŒcœä‹`�m‘åŠw�j ˜_•¶–¼Prediction of radial variation of plasma structure and ion distribution in the wafer interface in two-frequency capacitively coupled plasma ŽGŽ�–¼IEEE Transaction on Plasma Science Vo1. 32(2004) pp.90-100 (Invited Review Paper) ’˜ŽÒ–¼Takashi Yagisawa, Kazunobu Maeshige,Takashi Shimada and Toshiaki Makabe (Keio University) ‘æ‚Q‰ñ�i2003”N“x�j
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Žó�ÜŽÒŽR“c�_•¶�i“Œ—m‘åŠw�j�C‰ª–{�K—Y�i“Œ—m‘åŠw�j ˜_•¶–¼Characteristics of a high-power microwave-induced helium plasma at atmospheric pressure for the determination of nonmetals in aqueous solution ŽGŽ�–¼Applied Spectroscopy, Vol. 55, No. 2, pp. 114-119 (2001) ’˜ŽÒ–¼Hirofumi Yamada and Yukio Okamoto (Toyo University) ˜_•¶�m2�n
Žó�ÜŽÒ�¬�¼�³“ñ˜Y�i•¨Ž¿Œ¤‹†�Š�j�D‘q“ˆŒhŽŸ�i•¨Ž¿Œ¤‹†�Š�j�D‰ª“c�Ÿ�s�i•¨Ž¿Œ¤‹†�Š�j�DŽO—FŒì�i•¨Ž¿Œ¤‹†�Š�j�DŽç‹g—C‰î�i–@�‘åŠw�j�D�´�…’õŽ÷�iŽY‹Æ‹Z�p‘��‡Œ¤‹†�Š�j�D”’’J�³Ž¡�i‹ã�B‘åŠw�j�D’†–ì�rŽ÷�i–h‰q‘åŠw�j�DЦ�ì�½“ñ�i“Œ–k‘åŠw�j ˜_•¶–¼Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser depositon: An ultraviolet light emitter at 225 nm ŽGŽ�–¼Applied Physics Letters, Vol. 81, No. 24, pp. 4547-4549 (2002) ’˜ŽÒ–¼Shojiro Komatsu, Keiji Kurashima, Hisao Kanda, Katsuyuki Okada, and Mamoru Mitomo (National Institute for Material Science); Yusuke Moriyoshi (Hosei University); Yoshiki Shimizu (National Institute of Advanced Industrial Science and Technology); Masaharu Shiratani (Kyushu University); Toshiki Nakano(National Defense Academy); Seiji Samukawa (Tohoku University) ‘æ‚P‰ñ�i2002”N“x�j
˜_•¶ Žó�ÜŽÒ�‚“‡�¬�„�i“ú–{ƒŒ�[ƒU“dŽq�j�C–x�Ÿ�i–¼ŒÃ‰®‘åŠw�j�CŒã“¡�r•v�i–¼ŒÃ‰®‘åŠw�j�C‰Í–ì–¾œA�i–¼ŒÃ‰®‘åŠw�j�C•Ä“c�Ÿ›‰�i“ú–{ƒŒ�[ƒU“dŽq�j�C‘½“c�d˜a�iITXƒC�[�EƒOƒ��[ƒoƒŒƒbƒW�j�CˆÉ“¡�¹•¶�i˜a‰ÌŽR‘åŠw�j�C•lŠ_Šw�i—�‰»ŠwŒ¤‹†�Š�j ˜_•¶–¼1Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas ŽGŽ�–¼1Journal of Applied Physics, Vol. 90, No. 11, pp. 5497-5503 (2001) ’˜ŽÒ–¼1Seigou Takashima, Masaru Hori, Toshio Goto, Akihiro Kono, Katsumi Yoneda (Nagoya University); Katsumi Yoneda (Nippon Laser & Electronics LAB.) ˜_•¶–¼2Investigation of nitrogen atoms in low-pressure nitrogen plasmas using a compact electron-beam-excited plasma source ŽGŽ�–¼2Japanese Journal of Applied Physics, Vol. 41, No. 7(A), pp. 4691-4695 (2002) ’˜ŽÒ–¼2Shigekazu Tada, Seigou Takashima (Nagoya University); Masafumi Ito (Wakayama University); Manabu Hamagaki (RIKEN); Masaru Hori, Toshio Goto (Nagoya University)