ƒvƒ‰ƒYƒ}ƒGƒŒƒNƒgƒƒjƒNƒXÜ (Plasma Electronics Award)@ŽóÜŽÒ‚̏Љîi2003”N`j

 ‘æ20‰ñi2021”N“xj

˜_•¶

m1n

ŽóÜŽÒ
‘吼 LiƒŒ[ƒU[ƒeƒbƒNŠ”Ž®‰ïŽÐjAŽRè •¶“¿iŽO•H“d‹@Š”Ž®‰ïŽÐjA ” è Šì˜Yi“ŒŽÅƒGƒlƒ‹ƒM[ƒVƒXƒeƒ€Š”Ž®‰ïŽÐjA ’|‘º «¹Ž÷Aª’à “āAÔ’Ë —mi“Œ‹žH‹Æ‘åŠwj
˜_•¶–¼
Measurement of electron temperature and density of atmospheric-pressure non-equilibrium argon plasma examined with optical emission spectroscopy
ŽGŽ–¼
Japanese Journal of Applied Physics 60, 026002 (2021)
’˜ŽÒ–¼
Hiroshi Onishi, Fuminori Yamazaki, Yoshiro Hakozaki, Masaki Takemura, Atsushi Nezu, and Hiroshi Akatsuka
˜_•¶

m2n

ŽóÜŽÒ
²X–Ø Â‘¾A‚“‡ Œ\‰îA‹àŽq r˜Yi“Œ–k‘åŠwj
˜_•¶–¼
Portable Plasma Device for Electric N2O5 Production from Air
ŽGŽ–¼
Industrial & Engineering Chemistry Research 60, 798-801 (2021)
’˜ŽÒ–¼
Shota Sasaki, Keisuke Takashima, and Toshiro Kaneko

  

 ‘æ19‰ñi2020”N“xj

˜_•¶

m1n

ŽóÜŽÒ
‹à Ú_A”Š_ G’mAå“c ‘niŽY‹Æ‹Zp‘‡Œ¤‹†Šj
˜_•¶–¼
Low-Temperature Graphene Growth by Forced Convection of Plasma-Excited Radicals
ŽGŽ–¼
Nano Letters 19, 739 (2019)
’˜ŽÒ–¼
Jaeho Kim, Hajime Sakakita, and Hiromoto Itagaki
˜_•¶

m2n

ŽóÜŽÒ
²“¡ DOAŽÄ“c ‘iƒpƒiƒ\ƒjƒbƒNŠ”Ž®‰ïŽÐjAè•” Œpˆê˜YA]—˜Œû _“ñi‹ž“s‘åŠwj
˜_•¶–¼
Evaluation of residual defects created by plasma exposure of Si substrates using vertical and lateral pn junctions
ŽGŽ–¼
Journal of Vacuum Science and Technology B38, 012205 (2020)
’˜ŽÒ–¼
Yoshihiro Sato, Satoshi Shibata, Keiichiro Urabe, and Koji Eriguchi

  

 ‘æ18‰ñi2019”N“xj

˜_•¶

m1n

ŽóÜŽÒ
‹v•ÛˆäMsiƒ\ƒj[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…[ƒVƒ‡ƒ“ƒYŠ”Ž®‰ïŽÐjA’C–¤“N–çiƒ\ƒj[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…[ƒVƒ‡ƒ“ƒYŠ”Ž®‰ïŽÐjA¬’¬ AŽRì^–íiƒ\ƒj[ƒZƒ~ƒRƒ“ƒ_ƒNƒ^ƒ\ƒŠƒ…[ƒVƒ‡ƒ“ƒYŠ”Ž®‰ïŽÐj
˜_•¶–¼
Insights into different etching properties of continuous wave and atomic layer etching processes for SiO2 and Si3N4 films using voxel-slab mode
ŽGŽ–¼
Journal of Vacuum Science & Technology A 37, 051004 (2019)
’˜ŽÒ–¼
Nobuyuki Kuboi, Tetsuya Tatsumi, Jun Komachi, and Shinya Yamakawa
˜_•¶

m2n

ŽóÜŽÒ
‘呺ŒõLiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjA‹´–{“ÕˆêiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjA‘«—§V‘ñiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjA‹ß“¡—S‰îiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjAÎìŸ˜NiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjAˆ¢•”~ŽqiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjAŽðˆäˆÉ“sŽqiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjA—Ñ ‹v‹MiƒLƒIƒNƒVƒAŠ”Ž®‰ïŽÐjAŠÖª ½i–¼ŒÃ‰®‘åŠwjA–x Ÿi–¼ŒÃ‰®‘åŠwj
˜_•¶–¼
Formation mechanism of sidewall striation in high-aspect-ratio hole etching
ŽGŽ–¼
Japanese Journal of Applied Physics 58, SEEB02 (2019)
’˜ŽÒ–¼
itsuhiro Omura, Junichi Hashimoto, Takahiro Adachi, Yusuke Kondo, Masao Ishikawa, Junko Abe, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine, and Masaru Hori

 

 ‘æ17‰ñi2018”N“xj

˜_•¶

m1n

ŽóÜŽÒ
•z‘º ³‘¾iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjAâ“c Œ÷iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjA¼Œ´ _ŽiiŽY‹Æ‹Zp‘‡Œ¤‹†Šj
˜_•¶–¼
Plasma-Induced Electronic Defects: Generation and Annihilation Kinetics in Hydrogenated Amorphous Silicon
ŽGŽ–¼
Physical Review Applied, 10, 054006 (2018)
’˜ŽÒ–¼
Shota Nunomura, Isao Sakata, and Koji Matsubara
˜_•¶

m2n

ŽóÜŽÒ
‘呺 ŒõLi“ŒŽÅƒƒ‚ƒŠ(Š”)jAŒÃ–{ ˆêmi“ŒŽÅƒƒ‚ƒŠ(Š”)jA¼“c ˜a‹vi“ŒŽÅƒƒ‚ƒŠ(Š”)jA²X–Ø rsi“ŒŽÅƒƒ‚ƒŠ(Š”)jAŽðˆä ˆÉ“sŽqi“ŒŽÅƒƒ‚ƒŠ(Š”)jA—Ñ ‹v‹Mi“ŒŽÅƒƒ‚ƒŠ(Š”)j
˜_•¶–¼
Layer-by-layer etching of LaAlSiOx
ŽGŽ–¼
Plasma Sources Science and Technology, 26, 065015 (2017)
’˜ŽÒ–¼
Mitsuhiro Omura, Kazuhito Furumoto, Kazuhisa Matsuda, Toshiyuki Sasaki, Itsuko Sakai and Hisataka Hayashi

 

 ‘æ16‰ñi2017”N“xj

˜_•¶

m1n

ŽóÜŽÒ
¼ŽR C•ãi–kŠC“¹‘åŠwjA’†–ì Ž¡‹viŠj—Z‡‰ÈŠwŒ¤‹†ŠjAŒã“¡ ŠîŽuiŠj—Z‡‰ÈŠwŒ¤‹†ŠjA²X–Ø _ˆêi–kŠC“¹‘åŠwj
˜_•¶–¼
Stark spectroscopy at Balmer-ƒ¿ line of atomic hydrogen for measuring sheath electric field in a hydrogen plasma
ŽGŽ–¼
Journal of Physics D: Applied Physics, 50, 234003 (2017)
’˜ŽÒ–¼
Shusuke Nishiyama, Haruhisa Nakano, Motoshi Goto, and Koichi Sasaki
˜_•¶

m2n

ŽóÜŽÒ
•x“c Œ’‘¾˜Yi‹ãB‘åŠwjA²“¡ —S‘¾i‹ãB‘åŠwjA’zŽR »ˆêi‹ãB‘åŠwjA]Œû Žõ–¾i‹ãB‘åŠwjA“à–ì Šìˆê˜Yi‹ãB‘åŠwjA_‰Æ Kˆê˜YiƒMƒKƒtƒHƒgƒ“Š”Ž®‰ïŽÐjAŒËŽº Œ[–¾iƒMƒKƒtƒHƒgƒ“Š”Ž®‰ïŽÐjAaŒû ŒviƒMƒKƒtƒHƒgƒ“Š”Ž®‰ïŽÐjA»Œ´ ~iPurdue ‘åŠwjA¼Œ´ Œ÷Ci‘åã‘åŠwj
˜_•¶–¼
Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources
ŽGŽ–¼
Scientific Reports, 7, 12328 (2017)
’˜ŽÒ–¼
Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, Toshiaki Eguchi, Kiichiro Uchino, Kouichiro Kouge, Hiroaki Tomuro, Tatsuya Yanagida, Yasunori Wada, Masahito Kunishima, Georg Soumagne, Takeshi Kodama, Hakaru Mizoguchi, Atsushi Sunahara, and Katsunobu Nishihara

 

‘æ15‰ñi2016”N“xj

˜_•¶

m1n

ŽóÜŽÒ
™Z‹Ê ’¼li‹à‘ò‘åŠwjA“c’† N‹Ki‹à‘ò‘åŠwjA–k Œ’‘¾˜Yi’†•”“d—́jAã™ Šì•Fi‹à‘ò‘åŠwjAÎ“‡ ’B•vi‹à‘ò‘åŠwjA“nç² Žüi“ú´»•²ƒOƒ‹[ƒv–{ŽÐjA’†‘º Œ\‘¾˜Yi“ú´»•²ƒOƒ‹[ƒv–{ŽÐj
˜_•¶–¼
A method for large-scale synthesis of Al-doped TiO2 nanopowder using pulse-modulated induction thermal plasmas with time-controlled feedstock feeding
ŽGŽ–¼
Journal of Physics D: Appl. Phys., 47,195304 (2014)
’˜ŽÒ–¼
Naoto Kodama, Yasunori Tanaka,Kentaro Kita, Yoshihiko Uesugi,Tatsuo Ishijima, Shu Watanabe and Keitaro Nakamura
˜_•¶

m2n

ŽóÜŽÒ
²X–Ø Â‘¾i“Œ–k‘åŠwjA_è “Wi“Œ–k‘åŠwjA‹àŽq r˜Yi“Œ–k‘åŠwj
˜_•¶–¼
Calcium influx through TRP channels induced by short-lived reactive species in plasma-irradiated solution
ŽGŽ–¼
Scientific Reports, 6, 25728 (2016)
’˜ŽÒ–¼
Shota Sasaki, Makoto Kanzaki and Toshiro Kaneko

 ‘æ14‰ñi2015”N“xj

˜_•¶

m1n

ŽóÜŽÒ
”Š_ “Þ•ä (‹ãB‘åŠw)A¼“‡ Gˆê (‹ãB‘åŠw)AŽR‰º ‘å•ã (‹ãB‘åŠw)A™ çé—Y (‹ãB‘åŠw)AŒÃŠÕ ˆêŒ› (‹ãB‘åŠw)A”’’J ³Ž¡ (‹ãB‘åŠw)
˜_•¶–¼
Synthesis and Characterization of ZnInON Semiconductor: a ZnO-based Compound with Tunable Band Gap
ŽGŽ–¼
Materials Research Express 1, 036405 (2014)
’˜ŽÒ–¼
Naho Itagaki, Koichi Matsushima, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, and Masaharu Shiratani
˜_•¶

m2n

ŽóÜŽÒ
‹T“‡ îŒá (“Œ‹žH‹Æ‘åŠw)A“c‘º šõŽu˜N (“Œ‹žH‹Æ‘åŠw)AÎ‹´ —T‘¾˜Yi“ú´»•²(Š”)jA–ìè ’q—m (“Œ‹žH‹Æ‘åŠw)
˜_•¶–¼
Pulsed dry methane reforming in plasma-enhanced catalytic reaction
ŽGŽ–¼
Catalysis Today, 256, 67 (2015)
’˜ŽÒ–¼
Seigo Kameshima, Keishiro Tamura, Yutaro Ishibashi, and Tomohiro Nozaki

 

‘æ13‰ñi2014”N“xj

˜_•¶

m1n

ŽóÜŽÒ
–{ŠÔ Œ[ˆê˜Yi–{“c‹ZŒ¤H‹ÆjC_Œ´ ~i“Œ‹ž‘åŠwj
˜_•¶–¼
High throughput production of nanocomposite SiO2 powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries
ŽGŽ–¼
Sci. Technol. Adv. Mater., 15, 025006 (2014)
’˜ŽÒ–¼
Keiichiro Homma, Makoto Kambara and Toyonobu Yoshida
˜_•¶

m2n

ŽóÜŽÒ
‹v•Ûˆä Msiƒ\ƒj[iŠ”jjC’C–¤ “N–çiƒ\ƒj[iŠ”jjC[‘ò ³‰iiƒ\ƒj[iŠ”jjC–؉º —²iƒ\ƒj[iŠ”jjC¬’¬ iƒ\ƒj[iŠ”jjCˆÀâV ‹v_iƒ\ƒj[iŠ”jj
˜_•¶–¼
Effect of open area ratio and pattern structure on fluctuations in critical dimension and Si recess
ŽGŽ–¼
J. Vac. Sci. Technol., A31, 061304 (2013)
’˜ŽÒ–¼
Nobuyuki Kuboi, Tetsuya Tatsumi, Masanaga Fukasawa, Takashi Kinoshita, Jun Komachi, Hisahiro Ansai and Hiroyuki Miwa

 

‘æ12‰ñi2013”N“xj

˜_•¶

m1n

ŽóÜŽÒ
‰Á“¡rŒ°i“Œ–k‘åŠwjC”©ŽR—ÍŽOi“Œ–k‘åŠwj
˜_•¶–¼
Site- and alignment-controlled growth of graphene nanoribbons from nickel nanobars
ŽGŽ–¼
Nature Nanotechnol. 7, 651 (2012)
’˜ŽÒ–¼
T. Kato and R. Hatakeyama
˜_•¶

m2n

ŽóÜŽÒ
‹v•ÛˆäMsiƒ\ƒj[iŠ”jjC’C–¤“N–çiƒ\ƒj[iŠ”jjC¬—ѐ³Ž¡iƒ\ƒj[iŠ”jjC–؉º—²iƒ\ƒj[iŠ”jjC¬’¬iƒ\ƒj[iŠ”jjC[‘ò³‰iiƒ\ƒj[iŠ”jjCˆÀÖ‹v_iƒ\ƒj[iŠ”jj
˜_•¶–¼
Modeling and simulation of plasmainduced damage distribution during hole etching of SiO2 over Si substrate by fluorocarbon plasma
ŽGŽ–¼
Appl. Phys. Express, 5, 126201 (2012)
’˜ŽÒ–¼
N. Kuboi, T. Tatsumi, S. Kobayashi, T. Kinoshita, J. Komachi, M. Fukasawa and H. Ansai

 

‘æ11‰ñi2012”N“xj

˜_•¶

m1n

ŽóÜŽÒ
Îì Œ’Ž¡(–¼ŒÃ‰®‘åŠw)C˜hŒ©’¼–ç(“Œ–MƒKƒX)C‰Í–ì º•F(‹à‘òH‹Æ‘åŠw)C–xç² ‰p•v(‹à‘òH‹Æ‘åŠw)C’|“c Œ\Œá(–¼ŒÃ‰®‘åŠw)C‹ß“¡ ”ŽŠî(–¼ŒÃ‰®‘åŠw)CŠÖª ½(–¼ŒÃ‰®‘åŠw)C–x Ÿ(–¼ŒÃ‰®‘åŠw)
˜_•¶–¼
Synergistic Formation of Radicals by Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real-time in situ Electron Spin Resonance Study
ŽGŽ–¼
J. Phys. Chem. Lett. 2, 1278-1281 (2011)
’˜ŽÒ–¼
Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
˜_•¶

m2n

ŽóÜŽÒ
ˆÉ“¡ ’qŽq(‘åã‘åŠw)C“‚‹´ ˆê_(‘åã‘åŠw)C[‘ò ³‰i(ƒ\ƒj[(Š”))C’C–¤ “N–ç(ƒ\ƒj[(Š”))C•lŒû ’qŽu(‘åã‘åŠw)
˜_•¶–¼
Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion
ŽGŽ–¼
Jpn. J. Appl. Phys. 50, 08KD02 (5pp) (2011)
’˜ŽÒ–¼
Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, and Satoshi Hamaguchi

 

‘æ10‰ñi2011”N“xj

˜_•¶
ŽóÜŽÒ
æâ@‰n i‰Í“ì”_‹Æ‘åŠwA’†‘jC‰¬–ì@–¾‹v iÃ‰ª‘åŠwjC‰i’Á@‰ëÍ iÃ‰ª‘åŠwj
˜_•¶–¼
Effects of N2-O2 Gas Mixture Ratio on Microorganism Inactivation in Low-@Pressure Surface Wave Plasma
ŽGŽ–¼
Japanese Journal of Applied Physics 50 (2011) 08JF05
’˜ŽÒ–¼
Ying Zhao, Akihisa Ogino, and Masaaki Nagatsu

 

 

‘æ‚X‰ñi2010”N“xj

˜_•¶

m1n

ŽóÜŽÒ
’‡‘ºŒb‰EiŽO•H“d‹@jCà_“c‘å•ã(P&GƒWƒƒƒpƒ“)Cã“c‹`–@(ìèdH)C]—˜Œû_“ñi‹ž“s‘åŠwjC•€‚ˆêi‹ž“s‘åŠwj
˜_•¶–¼
Selective Etching of High-k Dielectric HfO2 Films over Si in BCl3-Containing Plasmas without rf Biasing
ŽGŽ–¼
Applied Physics Express 2, 016503 (2009)
’˜ŽÒ–¼
K. Nakamura, D. Hamada, Y. Ueda, K. Eriguchi and K. Ono
˜_•¶

m2n

ŽóÜŽÒ
“à“c‹Vˆê˜Yi‹ãB‘åŠwjC“à“c—@iŽñ“s‘åŠw“Œ‹žjCHŽR—˜KiŽŸ¢‘ãPDPŠJ”­ƒZƒ“ƒ^[jC
ŠŽR”ŽŽiiL“‡‘åŠwjCŽÂ“c™B(L“‡‘åŠw)
˜_•¶–¼
Effect of high Xe-concentration in a plasma display panel with a SrCaO cold cathode
ŽGŽ–¼
Journal of Applied Physics 107, 103311 (2010)
’˜ŽÒ–¼
G. Uchida, S. Uchida, T. Akiyama, H. Kajiyama and T. Shinoda

 

‘æ‚W‰ñi2009”N“xj

˜_•¶
ŽóÜŽÒ
w“à˜ÅèÁi“Œ–k‘åŠwjCÜ“c•qKiOKIƒZƒ~ƒRƒ“ƒ_ƒNƒ^‹{éjC‹´–{i“Œ‹žƒGƒŒƒNƒgƒƒ“‹ZpŒ¤‹†ŠjC
Žs‹´—R¬iŽO—m“d‹@jC‘å’|_li“Œ–k‘åŠwjCŠ¦ì½“ñi“Œ–k‘åŠwj
˜_•¶–¼
On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process
ŽGŽ–¼
Journal of Vacuum Science and Technology, Vol. B25, No. 6, (2007) pp. 1808-1813
’˜ŽÒ–¼
B. Jinnai, T. Orita, M. Konishi, J. Hashimoto, Y. Ichihashi, A. Nishitani, S. Kadomura,, H. Ohtake, S. Samukawa

 

‘æ‚V‰ñi2008”N“xj

˜_•¶

m1n

ŽóÜŽÒ
”©ŽR—ÍŽO(“Œ–k‘åŠw)C‹àŽqr˜Y(“Œ–k‘åŠw)C—›‰i•ô(“Œ–k‘åŠw)C‰Á“¡rŒ°(“Œ–k‘åŠw)C”nê˜a•F(“Œ–k‘åŠw)C‰ª“cŒ’(“Œ–k‘åŠw)
˜_•¶–¼
Single-stranded DNA insertion into single-walled carbon nanotube by ion irradiation in an electrolyte plasma
ŽGŽ–¼
Japanese Journal of Applied Physics, 45 (2006) 8335-8339.
’˜ŽÒ–¼
T. Okada, T. Kaneko, R. Hatakeyama
˜_•¶

m2n

˜_•¶–¼
Novel-structured carbon nanotubes creation by nanoscopic plasma control
ŽGŽ–¼
Plasma Sources Science and Technology 17 (2008) 024009 (11 pages)
’˜ŽÒ–¼
R. Hatakeyama, T. Kaneko, W. Oohara, Y. F. Li, T. Kato, K. Baba, J. Shishido

‘æ‚U‰ñi2007”N“xj

˜_•¶
ŽóÜŽÒ
Ž›“ˆ˜a•v(“Œ‹ž‘åŠw)C☋‚–¾(“Œ‹ž‘åŠw)C•Ð•½Œ¤(“Œ‹ž‘åŠw)C‹v•ÛGä(“Œ‹ž‘åŠw)C´…’õŽ÷(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)C²X–Ø‹B(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)C‰zè’¼l(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)
˜_•¶–¼
Carbon materials syntheses using dielectric barrier discharge microplasma in supercritical carbon dioxide environments
ŽGŽ–¼
The Journal of Supercritical Fluids 41 (2007) 404-411.
’˜ŽÒ–¼
Takaaki Tomai, Ken Katahira, Hirotake Kubo, Yoshiki Shimizu, Takeshi Sasaki, Naoto Koshizaki, Kazuo Terashima

‘æ‚T‰ñi2006”N“xj

˜_•¶
ŽóÜŽÒ
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Suppression of oxygen impurity incorporation into silicon films prepared from surface-wave excited H2/SiH4 plasma
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Japanese Journal of Applied Physics, 43 (2004) 7696-7700.
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S. Somiya, H. Toyoda, Y. Hotta, H. Sugai

‘æ‚S‰ñi2005”N“xj

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Žðˆä@“¹i‹ž“s‘åŠwjCâŒû‘ñ¶i‹ž“s‘åŠwjCˆÉ“¡—z‰îi‹ž“s‘åŠwjC‹k@–M‰pi‹ž“s‘åŠwj
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Interaction and control of millimeter-waves with microplasma arrays
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Plasma Physics and Controlled Fusion, Vol. 47 (2005) B617-B627.
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O.Sakai, T. Sakaguchi, Y. Ito and K. Tachibana

‘æ‚R‰ñi2004”N“xj

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ŒÃŠÕˆêŒ›i‹ãB‘åŠwjCb”㊲‰piŽO—m“d‹@jC”’’J³Ž¡i‹ãB‘åŠwjC“n•Óª•vi‹ãB‘åŠwjCŽ­’J¸i•Ÿ‰ªH‹Æ‘åŠwj
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Cluster-suppressed plasma chemical vapor deposition metbod for high quality hydrogenated amorphous silicon films
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Japanese Journal of Applied Physics, Vol. 41(2002) pp.L168-L170 (Express Letters)
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Kazunori Koga, Motohide Kai, Masaharu Shiratani, Yukio Watanabe (Kyushu University); Noboru Shikatani (Fukuoka Institute of Technology)
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m2n

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”ª–ØàV‘ìiŒcœä‹`m‘åŠwjC‘Od˜aLiˆ®ÉŽqjC“‡“c‘ìiŒcœä‹`m‘åŠwjC^•Ç—˜–¾iŒcœä‹`m‘åŠwj
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Prediction of radial variation of plasma structure and ion distribution in the wafer interface in two-frequency capacitively coupled plasma
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IEEE Transaction on Plasma Science Vo1. 32(2004) pp.90-100 (Invited Review Paper)
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Takashi Yagisawa, Kazunobu Maeshige,Takashi Shimada and Toshiaki Makabe (Keio University)

‘æ‚Q‰ñi2003”N“xj

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ŽR“c_•¶i“Œ—m‘åŠwjC‰ª–{K—Yi“Œ—m‘åŠwj
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Characteristics of a high-power microwave-induced helium plasma at atmospheric pressure for the determination of nonmetals in aqueous solution
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Applied Spectroscopy, Vol. 55, No. 2, pp. 114-119 (2001)
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Hirofumi Yamada and Yukio Okamoto (Toyo University)
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¬¼³“ñ˜Yi•¨Ž¿Œ¤‹†ŠjD‘q“ˆŒhŽŸi•¨Ž¿Œ¤‹†ŠjD‰ª“cŸsi•¨Ž¿Œ¤‹†ŠjDŽO—FŒìi•¨Ž¿Œ¤‹†ŠjDŽç‹g—C‰îi–@­‘åŠwjD´…’õŽ÷iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjD”’’J³Ž¡i‹ãB‘åŠwjD’†–ìrŽ÷i–h‰q‘åŠwjDŠ¦ì½“ñi“Œ–k‘åŠwj
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Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser depositon: An ultraviolet light emitter at 225 nm
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Applied Physics Letters, Vol. 81, No. 24, pp. 4547-4549 (2002)
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Shojiro Komatsu, Keiji Kurashima, Hisao Kanda, Katsuyuki Okada, and Mamoru Mitomo (National Institute for Material Science); Yusuke Moriyoshi (Hosei University); Yoshiki Shimizu (National Institute of Advanced Industrial Science and Technology); Masaharu Shiratani (Kyushu University); Toshiki Nakano(National Defense Academy); Seiji Samukawa (Tohoku University)

‘æ‚P‰ñi2002”N“xj

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‚“‡¬„i“ú–{ƒŒ[ƒU“dŽqjC–xŸi–¼ŒÃ‰®‘åŠwjCŒã“¡r•vi–¼ŒÃ‰®‘åŠwjC‰Í–ì–¾œAi–¼ŒÃ‰®‘åŠwjC•Ä“cŸ›‰i“ú–{ƒŒ[ƒU“dŽqjC‘½“cd˜aiITXƒC[EƒOƒ[ƒoƒŒƒbƒWjCˆÉ“¡¹•¶i˜a‰ÌŽR‘åŠwjC•lŠ_Šwi—‰»ŠwŒ¤‹†Šj
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Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas
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Journal of Applied Physics, Vol. 90, No. 11, pp. 5497-5503 (2001)
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Seigou Takashima, Masaru Hori, Toshio Goto, Akihiro Kono, Katsumi Yoneda (Nagoya University); Katsumi Yoneda (Nippon Laser & Electronics LAB.)
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Investigation of nitrogen atoms in low-pressure nitrogen plasmas using a compact electron-beam-excited plasma source
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Japanese Journal of Applied Physics, Vol. 41, No. 7(A), pp. 4691-4695 (2002)
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Shigekazu Tada, Seigou Takashima (Nagoya University); Masafumi Ito (Wakayama University); Manabu Hamagaki (RIKEN); Masaru Hori, Toshio Goto (Nagoya University)