ƒvƒ‰ƒYƒ}ƒGƒŒƒNƒgƒƒjƒNƒXÜ (Plasma Electronics Award)@ŽóÜŽÒ‚̏Љîi2003”N`j

 

 ‘æ16‰ñi2017”N“xj

˜_•¶

m1n

ŽóÜŽÒ
•z‘º ³‘¾iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjAâ“c Œ÷iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjA¼Œ´ _ŽiiŽY‹Æ‹Zp‘‡Œ¤‹†Šj
˜_•¶–¼
Plasma-Induced Electronic Defects: Generation and Annihilation Kinetics in Hydrogenated Amorphous Silicon
ŽGŽ–¼
Physical Review Applied, 10, 054006 (2018)
’˜ŽÒ–¼
Shota Nunomura, Isao Sakata, and Koji Matsubara
˜_•¶

m2n

ŽóÜŽÒ
‘呺 ŒõLi“ŒŽÅƒƒ‚ƒŠ(Š”)jAŒÃ–{ ˆêmi“ŒŽÅƒƒ‚ƒŠ(Š”)jA¼“c ˜a‹vi“ŒŽÅƒƒ‚ƒŠ(Š”)jA²X–Ø rsi“ŒŽÅƒƒ‚ƒŠ(Š”)jAŽðˆä ˆÉ“sŽqi“ŒŽÅƒƒ‚ƒŠ(Š”)jA—Ñ ‹v‹Mi“ŒŽÅƒƒ‚ƒŠ(Š”)j
˜_•¶–¼
Layer-by-layer etching of LaAlSiOx
ŽGŽ–¼
Plasma Sources Science and Technology, 26, 065015 (2017)
’˜ŽÒ–¼
Mitsuhiro Omura, Kazuhito Furumoto, Kazuhisa Matsuda, Toshiyuki Sasaki, Itsuko Sakai and Hisataka Hayashi

 

‘æ15‰ñi2016”N“xj

˜_•¶

m1n

ŽóÜŽÒ
™Z‹Ê ’¼li‹à‘ò‘åŠwjA“c’† N‹Ki‹à‘ò‘åŠwjA–k Œ’‘¾˜Yi’†•”“d—́jAã™ Šì•Fi‹à‘ò‘åŠwjAÎ“‡ ’B•vi‹à‘ò‘åŠwjA“nç² Žüi“ú´»•²ƒOƒ‹[ƒv–{ŽÐjA’†‘º Œ\‘¾˜Yi“ú´»•²ƒOƒ‹[ƒv–{ŽÐj
˜_•¶–¼
A method for large-scale synthesis of Al-doped TiO2 nanopowder using pulse-modulated induction thermal plasmas with time-controlled feedstock feeding
ŽGŽ–¼
Journal of Physics D: Appl. Phys., 47,195304 (2014)
’˜ŽÒ–¼
Naoto Kodama, Yasunori Tanaka,Kentaro Kita, Yoshihiko Uesugi,Tatsuo Ishijima, Shu Watanabe and Keitaro Nakamura
˜_•¶

m2n

ŽóÜŽÒ
²X–Ø Â‘¾i“Œ–k‘åŠwjA_è “Wi“Œ–k‘åŠwjA‹àŽq r˜Yi“Œ–k‘åŠwj
˜_•¶–¼
Calcium influx through TRP channels induced by short-lived reactive species in plasma-irradiated solution
ŽGŽ–¼
Scientific Reports, 6, 25728 (2016)
’˜ŽÒ–¼
Shota Sasaki, Makoto Kanzaki and Toshiro Kaneko

 ‘æ14‰ñi2015”N“xj

˜_•¶

m1n

ŽóÜŽÒ
”Š_ “Þ•ä (‹ãB‘åŠw)A¼“‡ Gˆê (‹ãB‘åŠw)AŽR‰º ‘å•ã (‹ãB‘åŠw)A™ çé—Y (‹ãB‘åŠw)AŒÃŠÕ ˆêŒ› (‹ãB‘åŠw)A”’’J ³Ž¡ (‹ãB‘åŠw)
˜_•¶–¼
Synthesis and Characterization of ZnInON Semiconductor: a ZnO-based Compound with Tunable Band Gap
ŽGŽ–¼
Materials Research Express 1, 036405 (2014)
’˜ŽÒ–¼
Naho Itagaki, Koichi Matsushima, Daisuke Yamashita, Hyunwoong Seo, Kazunori Koga, and Masaharu Shiratani
˜_•¶

m2n

ŽóÜŽÒ
‹T“‡ îŒá (“Œ‹žH‹Æ‘åŠw)A“c‘º šõŽu˜N (“Œ‹žH‹Æ‘åŠw)AÎ‹´ —T‘¾˜Yi“ú´»•²(Š”)jA–ìè ’q—m (“Œ‹žH‹Æ‘åŠw)
˜_•¶–¼
Pulsed dry methane reforming in plasma-enhanced catalytic reaction
ŽGŽ–¼
Catalysis Today, 256, 67 (2015)
’˜ŽÒ–¼
Seigo Kameshima, Keishiro Tamura, Yutaro Ishibashi, and Tomohiro Nozaki

 

‘æ13‰ñi2014”N“xj

˜_•¶

m1n

ŽóÜŽÒ
–{ŠÔ Œ[ˆê˜Yi–{“c‹ZŒ¤H‹ÆjC_Œ´ ~i“Œ‹ž‘åŠwj
˜_•¶–¼
High throughput production of nanocomposite SiO2 powders by plasma spray physical vapor deposition for negative electrode of lithium ion batteries
ŽGŽ–¼
Sci. Technol. Adv. Mater., 15, 025006 (2014)
’˜ŽÒ–¼
Keiichiro Homma, Makoto Kambara and Toyonobu Yoshida
˜_•¶

m2n

ŽóÜŽÒ
‹v•Ûˆä Msiƒ\ƒj[iŠ”jjC’C–¤ “N–çiƒ\ƒj[iŠ”jjC[‘ò ³‰iiƒ\ƒj[iŠ”jjC–؉º —²iƒ\ƒj[iŠ”jjC¬’¬ iƒ\ƒj[iŠ”jjCˆÀâV ‹v_iƒ\ƒj[iŠ”jj
˜_•¶–¼
Effect of open area ratio and pattern structure on fluctuations in critical dimension and Si recess
ŽGŽ–¼
J. Vac. Sci. Technol., A31, 061304 (2013)
’˜ŽÒ–¼
Nobuyuki Kuboi, Tetsuya Tatsumi, Masanaga Fukasawa, Takashi Kinoshita, Jun Komachi, Hisahiro Ansai and Hiroyuki Miwa

 

‘æ12‰ñi2013”N“xj

˜_•¶

m1n

ŽóÜŽÒ
‰Á“¡rŒ°i“Œ–k‘åŠwjC”©ŽR—ÍŽOi“Œ–k‘åŠwj
˜_•¶–¼
Site- and alignment-controlled growth of graphene nanoribbons from nickel nanobars
ŽGŽ–¼
Nature Nanotechnol. 7, 651 (2012)
’˜ŽÒ–¼
T. Kato and R. Hatakeyama
˜_•¶

m2n

ŽóÜŽÒ
‹v•ÛˆäMsiƒ\ƒj[iŠ”jjC’C–¤“N–çiƒ\ƒj[iŠ”jjC¬—ѐ³Ž¡iƒ\ƒj[iŠ”jjC–؉º—²iƒ\ƒj[iŠ”jjC¬’¬iƒ\ƒj[iŠ”jjC[‘ò³‰iiƒ\ƒj[iŠ”jjCˆÀÖ‹v_iƒ\ƒj[iŠ”jj
˜_•¶–¼
Modeling and simulation of plasmainduced damage distribution during hole etching of SiO2 over Si substrate by fluorocarbon plasma
ŽGŽ–¼
Appl. Phys. Express, 5, 126201 (2012)
’˜ŽÒ–¼
N. Kuboi, T. Tatsumi, S. Kobayashi, T. Kinoshita, J. Komachi, M. Fukasawa and H. Ansai

 

‘æ11‰ñi2012”N“xj

˜_•¶

m1n

ŽóÜŽÒ
Îì Œ’Ž¡(–¼ŒÃ‰®‘åŠw)C˜hŒ©’¼–ç(“Œ–MƒKƒX)C‰Í–ì º•F(‹à‘òH‹Æ‘åŠw)C–xç² ‰p•v(‹à‘òH‹Æ‘åŠw)C’|“c Œ\Œá(–¼ŒÃ‰®‘åŠw)C‹ß“¡ ”ŽŠî(–¼ŒÃ‰®‘åŠw)CŠÖª ½(–¼ŒÃ‰®‘åŠw)C–x Ÿ(–¼ŒÃ‰®‘åŠw)
˜_•¶–¼
Synergistic Formation of Radicals by Irradiation with both Vacuum Ultraviolet and Atomic Hydrogen: a Real-time in situ Electron Spin Resonance Study
ŽGŽ–¼
J. Phys. Chem. Lett. 2, 1278-1281 (2011)
’˜ŽÒ–¼
Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
˜_•¶

m2n

ŽóÜŽÒ
ˆÉ“¡ ’qŽq(‘åã‘åŠw)C“‚‹´ ˆê_(‘åã‘åŠw)C[‘ò ³‰i(ƒ\ƒj[(Š”))C’C–¤ “N–ç(ƒ\ƒj[(Š”))C•lŒû ’qŽu(‘åã‘åŠw)
˜_•¶–¼
Si Recess of Polycrystalline Silicon Gate Etching: Damage Enhanced by Ion Assisted Oxygen Diffusion
ŽGŽ–¼
Jpn. J. Appl. Phys. 50, 08KD02 (5pp) (2011)
’˜ŽÒ–¼
Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, and Satoshi Hamaguchi

 

‘æ10‰ñi2011”N“xj

˜_•¶
ŽóÜŽÒ
æâ@‰n i‰Í“ì”_‹Æ‘åŠwA’†‘jC‰¬–ì@–¾‹v iÃ‰ª‘åŠwjC‰i’Á@‰ëÍ iÃ‰ª‘åŠwj
˜_•¶–¼
Effects of N2-O2 Gas Mixture Ratio on Microorganism Inactivation in Low-@Pressure Surface Wave Plasma
ŽGŽ–¼
Japanese Journal of Applied Physics 50 (2011) 08JF05
’˜ŽÒ–¼
Ying Zhao, Akihisa Ogino, and Masaaki Nagatsu

 

 

‘æ‚X‰ñi2010”N“xj

˜_•¶

m1n

ŽóÜŽÒ
’‡‘ºŒb‰EiŽO•H“d‹@jCà_“c‘å•ã(P&GƒWƒƒƒpƒ“)Cã“c‹`–@(ìèdH)C]—˜Œû_“ñi‹ž“s‘åŠwjC•€‚ˆêi‹ž“s‘åŠwj
˜_•¶–¼
Selective Etching of High-k Dielectric HfO2 Films over Si in BCl3-Containing Plasmas without rf Biasing
ŽGŽ–¼
Applied Physics Express 2, 016503 (2009)
’˜ŽÒ–¼
K. Nakamura, D. Hamada, Y. Ueda, K. Eriguchi and K. Ono
˜_•¶

m2n

ŽóÜŽÒ
“à“c‹Vˆê˜Yi‹ãB‘åŠwjC“à“c—@iŽñ“s‘åŠw“Œ‹žjCHŽR—˜KiŽŸ¢‘ãPDPŠJ”­ƒZƒ“ƒ^[jC
ŠŽR”ŽŽiiL“‡‘åŠwjCŽÂ“c™B(L“‡‘åŠw)
˜_•¶–¼
Effect of high Xe-concentration in a plasma display panel with a SrCaO cold cathode
ŽGŽ–¼
Journal of Applied Physics 107, 103311 (2010)
’˜ŽÒ–¼
G. Uchida, S. Uchida, T. Akiyama, H. Kajiyama and T. Shinoda

 

‘æ‚W‰ñi2009”N“xj

˜_•¶
ŽóÜŽÒ
w“à˜ÅèÁi“Œ–k‘åŠwjCÜ“c•qKiOKIƒZƒ~ƒRƒ“ƒ_ƒNƒ^‹{éjC‹´–{i“Œ‹žƒGƒŒƒNƒgƒƒ“‹ZpŒ¤‹†ŠjC
Žs‹´—R¬iŽO—m“d‹@jC‘å’|_li“Œ–k‘åŠwjCŠ¦ì½“ñi“Œ–k‘åŠwj
˜_•¶–¼
On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process
ŽGŽ–¼
Journal of Vacuum Science and Technology, Vol. B25, No. 6, (2007) pp. 1808-1813
’˜ŽÒ–¼
B. Jinnai, T. Orita, M. Konishi, J. Hashimoto, Y. Ichihashi, A. Nishitani, S. Kadomura,, H. Ohtake, S. Samukawa

 

‘æ‚V‰ñi2008”N“xj

˜_•¶

m1n

ŽóÜŽÒ
”©ŽR—ÍŽO(“Œ–k‘åŠw)C‹àŽqr˜Y(“Œ–k‘åŠw)C—›‰i•ô(“Œ–k‘åŠw)C‰Á“¡rŒ°(“Œ–k‘åŠw)C”nê˜a•F(“Œ–k‘åŠw)C‰ª“cŒ’(“Œ–k‘åŠw)
˜_•¶–¼
Single-stranded DNA insertion into single-walled carbon nanotube by ion irradiation in an electrolyte plasma
ŽGŽ–¼
Japanese Journal of Applied Physics, 45 (2006) 8335-8339.
’˜ŽÒ–¼
T. Okada, T. Kaneko, R. Hatakeyama
˜_•¶

m2n

˜_•¶–¼
Novel-structured carbon nanotubes creation by nanoscopic plasma control
ŽGŽ–¼
Plasma Sources Science and Technology 17 (2008) 024009 (11 pages)
’˜ŽÒ–¼
R. Hatakeyama, T. Kaneko, W. Oohara, Y. F. Li, T. Kato, K. Baba, J. Shishido

‘æ‚U‰ñi2007”N“xj

˜_•¶
ŽóÜŽÒ
Ž›“ˆ˜a•v(“Œ‹ž‘åŠw)C☋‚–¾(“Œ‹ž‘åŠw)C•Ð•½Œ¤(“Œ‹ž‘åŠw)C‹v•ÛGä(“Œ‹ž‘åŠw)C´…’õŽ÷(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)C²X–Ø‹B(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)C‰zè’¼l(ŽY‹Æ‹Zp‘‡Œ¤‹†Š)
˜_•¶–¼
Carbon materials syntheses using dielectric barrier discharge microplasma in supercritical carbon dioxide environments
ŽGŽ–¼
The Journal of Supercritical Fluids 41 (2007) 404-411.
’˜ŽÒ–¼
Takaaki Tomai, Ken Katahira, Hirotake Kubo, Yoshiki Shimizu, Takeshi Sasaki, Naoto Koshizaki, Kazuo Terashima

‘æ‚T‰ñi2006”N“xj

˜_•¶
ŽóÜŽÒ
@‹{‹Åi–¼ŒÃ‰®‘åŠwj, –L“c_Fi–¼ŒÃ‰®‘åŠwj, –x“c–F•Fi–¼ŒÃ‰®‘åŠwj, ›ˆäG˜Yi–¼ŒÃ‰®‘åŠw, Œ»@’†•”‘åŠwj
˜_•¶–¼
Suppression of oxygen impurity incorporation into silicon films prepared from surface-wave excited H2/SiH4 plasma
ŽGŽ–¼
Japanese Journal of Applied Physics, 43 (2004) 7696-7700.
’˜ŽÒ–¼
S. Somiya, H. Toyoda, Y. Hotta, H. Sugai

‘æ‚S‰ñi2005”N“xj

˜_•¶
ŽóÜŽÒ
Žðˆä@“¹i‹ž“s‘åŠwjCâŒû‘ñ¶i‹ž“s‘åŠwjCˆÉ“¡—z‰îi‹ž“s‘åŠwjC‹k@–M‰pi‹ž“s‘åŠwj
˜_•¶–¼
Interaction and control of millimeter-waves with microplasma arrays
ŽGŽ–¼
Plasma Physics and Controlled Fusion, Vol. 47 (2005) B617-B627.
’˜ŽÒ–¼
O.Sakai, T. Sakaguchi, Y. Ito and K. Tachibana

‘æ‚R‰ñi2004”N“xj

˜_•¶

m1n

ŽóÜŽÒ
ŒÃŠÕˆêŒ›i‹ãB‘åŠwjCb”㊲‰piŽO—m“d‹@jC”’’J³Ž¡i‹ãB‘åŠwjC“n•Óª•vi‹ãB‘åŠwjCŽ­’J¸i•Ÿ‰ªH‹Æ‘åŠwj
˜_•¶–¼
Cluster-suppressed plasma chemical vapor deposition metbod for high quality hydrogenated amorphous silicon films
ŽGŽ–¼
Japanese Journal of Applied Physics, Vol. 41(2002) pp.L168-L170 (Express Letters)
’˜ŽÒ–¼
Kazunori Koga, Motohide Kai, Masaharu Shiratani, Yukio Watanabe (Kyushu University); Noboru Shikatani (Fukuoka Institute of Technology)
˜_•¶

m2n

ŽóÜŽÒ
”ª–ØàV‘ìiŒcœä‹`m‘åŠwjC‘Od˜aLiˆ®ÉŽqjC“‡“c‘ìiŒcœä‹`m‘åŠwjC^•Ç—˜–¾iŒcœä‹`m‘åŠwj
˜_•¶–¼
Prediction of radial variation of plasma structure and ion distribution in the wafer interface in two-frequency capacitively coupled plasma
ŽGŽ–¼
IEEE Transaction on Plasma Science Vo1. 32(2004) pp.90-100 (Invited Review Paper)
’˜ŽÒ–¼
Takashi Yagisawa, Kazunobu Maeshige,Takashi Shimada and Toshiaki Makabe (Keio University)

‘æ‚Q‰ñi2003”N“xj

˜_•¶

m1n

ŽóÜŽÒ
ŽR“c_•¶i“Œ—m‘åŠwjC‰ª–{K—Yi“Œ—m‘åŠwj
˜_•¶–¼
Characteristics of a high-power microwave-induced helium plasma at atmospheric pressure for the determination of nonmetals in aqueous solution
ŽGŽ–¼
Applied Spectroscopy, Vol. 55, No. 2, pp. 114-119 (2001)
’˜ŽÒ–¼
Hirofumi Yamada and Yukio Okamoto (Toyo University)
˜_•¶

m2n

ŽóÜŽÒ
¬¼³“ñ˜Yi•¨Ž¿Œ¤‹†ŠjD‘q“ˆŒhŽŸi•¨Ž¿Œ¤‹†ŠjD‰ª“cŸsi•¨Ž¿Œ¤‹†ŠjDŽO—FŒìi•¨Ž¿Œ¤‹†ŠjDŽç‹g—C‰îi–@­‘åŠwjD´…’õŽ÷iŽY‹Æ‹Zp‘‡Œ¤‹†ŠjD”’’J³Ž¡i‹ãB‘åŠwjD’†–ìrŽ÷i–h‰q‘åŠwjDŠ¦ì½“ñi“Œ–k‘åŠwj
˜_•¶–¼
Highly crystalline 5H-polytype of sp3-bonded boron nitride prepared by plasma-packets-assisted pulsed-laser depositon: An ultraviolet light emitter at 225 nm
ŽGŽ–¼
Applied Physics Letters, Vol. 81, No. 24, pp. 4547-4549 (2002)
’˜ŽÒ–¼
Shojiro Komatsu, Keiji Kurashima, Hisao Kanda, Katsuyuki Okada, and Mamoru Mitomo (National Institute for Material Science); Yusuke Moriyoshi (Hosei University); Yoshiki Shimizu (National Institute of Advanced Industrial Science and Technology); Masaharu Shiratani (Kyushu University); Toshiki Nakano(National Defense Academy); Seiji Samukawa (Tohoku University)

‘æ‚P‰ñi2002”N“xj

˜_•¶
ŽóÜŽÒ
‚“‡¬„i“ú–{ƒŒ[ƒU“dŽqjC–xŸi–¼ŒÃ‰®‘åŠwjCŒã“¡r•vi–¼ŒÃ‰®‘åŠwjC‰Í–ì–¾œAi–¼ŒÃ‰®‘åŠwjC•Ä“cŸ›‰i“ú–{ƒŒ[ƒU“dŽqjC‘½“cd˜aiITXƒC[EƒOƒ[ƒoƒŒƒbƒWjCˆÉ“¡¹•¶i˜a‰ÌŽR‘åŠwjC•lŠ_Šwi—‰»ŠwŒ¤‹†Šj
˜_•¶–¼1
Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas
ŽGŽ–¼1
Journal of Applied Physics, Vol. 90, No. 11, pp. 5497-5503 (2001)
’˜ŽÒ–¼1
Seigou Takashima, Masaru Hori, Toshio Goto, Akihiro Kono, Katsumi Yoneda (Nagoya University); Katsumi Yoneda (Nippon Laser & Electronics LAB.)
˜_•¶–¼2
Investigation of nitrogen atoms in low-pressure nitrogen plasmas using a compact electron-beam-excited plasma source
ŽGŽ–¼2
Japanese Journal of Applied Physics, Vol. 41, No. 7(A), pp. 4691-4695 (2002)
’˜ŽÒ–¼2
Shigekazu Tada, Seigou Takashima (Nagoya University); Masafumi Ito (Wakayama University); Manabu Hamagaki (RIKEN); Masaru Hori, Toshio Goto (Nagoya University)