June 9-10, 2019, Rihga Royal Hotel Kyoto, Kyoto,
(held prior to VLSI Technology Symposium, Satellite Workshop of VLSI Symposia)
the Japan Society of Applied Physics and
the IEEE Electron Device
Deadline for Abstracts: March 31, 2019
The workshop will cover various aspects of
VLSI-related silicon nanoelectronics. Areas of interest include,
but are not limited to:
- Sub-10 nm transistors employing conventional and novel architectures including non-classical structures, novel channel and source/drain materials, non-thermal injection mechanisms
- Device physics of nanodevices including quantum effects, nonequilibrium and ballistic transport
- Modeling and simulation of nanoscale devices
- Extreme processing of nanostructures, including nanopatterning
- Junction and insulator materials and process technology for nanodevices
- Nanoscale surface, interface, and heterojunction effects in nanodevices
- Device scaling issues including doping fluctuations and atomic granularity
- Novel devises and architectures for non-classical computing, including quantum and neuromorphic computing
- Circuit design issues and novel circuit architectures for nanodevices
- Novel non-volatile memories, including MRAM, ReRAM, PCM, FeRAM, etc.
- Optoelectronics using silicon-based nanostructures
- Devices for heterogeneous integration on silicon, including 2D materials, Ge and III-V, CNT, spin-based devices, MEMS and NEMS, etc.
- Environmental devices which contribute to low-carbon society (wireless sensors, energy harvestors, steep slope devices, etc.)
Prospective authors are requested to submit an abstract of the
original work. The abstract must be prepared as a PDF file and
submitted ON-LINE at http://annex.jsap.or.jp/snw/ps.html
The abstract must consist of one page of text and one
page of figures. The abstract must include the title,
the author's names, affiliation, full address, phone and
FAX numbers, and e-mail address. Faxed copies of the abstract
will not be accepted. Accepted abstracts will be reproduced
in the workbook exactly as received. The deadline for abstracts
is March 31, 2019.
All accepted abstracts will be
published in IEEE Xplore.
Questions may be addressed to
toshifumi1.irisawa[at]aist.go.jp (T. Irisawa).
Registration forms and hotel reservation forms
will be provided in the Advanced Program of the 2019 VLSI Technology
Symposium. Some of the accepted papers will be presented in "Poster
Sessions". Further information can be obtained at http://annex.jsap.or.jp/snw/