Masato SHIBUYA and Tadao TSURUTA

Optical Division, Nikon Corporation, 1-6-3 Nishi-Ohi, Shinagawa-ku, Tokyo, 140 Japan

(Accepted January 24, 1995)

We earlier proposed an analytical and prospective method for evaluating projection optical lithography. In this paper, we apply it to more complicated cases, such as optimizing transparency of a half tone phase-shifting mask and considering the resolution enhancement technique which uses both multiple exposure and non-linear resist. We also apply it to the evaluation of isolated line patterns using 1:2 line-and-space patterns.

Key words : optical lithography, resolution enhancement, projection optics, phase-shift, evaluation, image contrast