Joost P. de KOCK, Seiji KOBAYASHI and Hisayuki YAMATSU

Opto-Electronics Division, Research Center, Sony Corp., 6-7-35 Kitashinagawa, Shinagawa-ku, Tokyo, 141 Japan

(Received July 10, 1995; Accepted September 2, 1995)

We developed a system to measure disk noise as a function of both radial and angular position. In order to obtain an accurate disk noise measurement, crosstalk and intersymbol interference were avoided by recording regularly repeating pit patterns and the influence of electronic and laser noise was removed by averaging techniques. We found the system's mapping ability and its high sensitivity to be very useful in investigating disk noise phenomena in the mastering process. We used the system to assess the accuracy and reproducibility of the photopolymerization replication and Al vapor deposition processes. Also, we investigated the choice of photoresist and found that photoresists with the combination of the narrowest molecular weight distribution and the highest photo-active compound content resulted in the lowest disk noise levels. Our system can, in principle, be adapted to evaluate magneto-optical and phase change disks.

Key words : optical disk, disk noise, media noise, photoresist, optical disk mastering