[OPTICAL REVIEW Vol. 4, No. 3 (1997) 385-389]

Theoretical Analysis of Super-Resolution Optical Disk Mastering Using a Photoreactive Dye Mask Layer

Tsuyoshi TSUJIOKA,1,* Minoru KUME1 and Masahiro IRIE2

1New Materials Research Center, SANYO Electric Co., Ltd., 1-18-13, Hashiridani, Hirakata-City, Osaka, 573 Japan, 2Department of Chemical Science and Technology, Faculty of Engineering, Kyushu University, 6-10-1, Hakosaki, Higashi-ku, Fukuoka, 812 Japan

(Received December 26, 1996; Accepted January 28, 1997)

The super-resolution mastering of read-only optical disks using a photoreactive bleachable dye mask layer was theoretically analyzed. Equations have been derived which describe the photoreactions of the resist layer and mask layer. A numerical simulation based on these equations showed that the transmittance of the mask directly affects the quality of the formed pit shape. A high-quality pit shape is obtained by using a low transmittance mask.

Key words : optical disk, photoreactive, dye, super-resolution, disk mastering