[OPTICAL REVIEW Vol. 5, No. 4 (1998) 242-246]
UV-Laser Ablation Spectroscopy in Element Analysis of Solid Surface
Yuji OKI, Takayuki TAKAO, Takumi NOMURA and Mitsuo MAEDA
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical Engineering, Kyushu University, 6-10-1, Hakozaki, Fukuoka, 812-8581 Japan
(Received November 25, 1997; Revised April 20, 1988; Accepted April 24, 1998)
Laser ablation for the atomic emission spectroscopy of a glass sample is studied using pulsed UV laser systems and the effect of the laser wavelength is investigated. The threshold fluence for ablation is decreased and the detection sensitivity is improved for shorter wavelengths. Furthermore, very thin (less than 1 nm/shot) surface slicing is possible at a wavelength as short as 193 nm. Polymers also show good ablation characteristics. Improvement of sensitivity and spatial resolution by using shorter wavelength laser ablation is discussed for Na detection in a glass sample.
Key words : laser ablation, surface analysis, laser spectroscopy, excimer laser, emission spectroscopy, subnanometer structure