[OPTICAL REVIEW Vol. 6, No. 3 (1999) 257-260]
Application of Solid Immersion Lens to Submicron Resolution Imaging of Nano-Scale Quantum Wells*
Motoyoshi BABA, Masahiro YOSHITA, Takeaki SASAKI and Hidefumi AKIYAMA
Institute for Solid State Physics, The University of Tokyo, 7-22-1, Roppongi, Minato-Ku, Tokyo, 106-8666 Japan
(Received December 7, 1998; Accepted January 19, 1999)
We have discussed the resolution of submicron photoluminescence (PL) imaging using a solid immersion lens (SIL), which collects an evanescent light field. We apply the SIL microscope to measure PL image of a strip-line-patterned GaAs quantum well structure at low temperature. An improved resolution beyond diffraction limit and high collection efficiency of PL are realized.
Key words : solid immersion lens, submicron resolution imaging, nano-scale quantum wells, near-field optics, spherical aberration, spatial resolution