[OPTICAL REVIEW Vol. 7, No. 6 (2000) 486-488]
Fabrication of an Ultraviolet Light-Emitting Functional Probe ofSub-Micron Size by Photochemical Vapor Deposition
Yoh YAMAMOTO,1 Guen-hyoung LEE,2,4 Kazunari MATSUDA,3 Takashi SHIMIZU,1 Motonobu KOUROGI1,2and Motoichi OHTSU1,2
1Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-Ku, Yokohama, Kanagawa, 226-8508 Japan, 2Japan Science and Technology Corporation, 671-1, Tsuruma, Machida, Tokyo, 194-0004 Japan, 3Kanagawa Academy of Science and Technology, Takatsu-Ku, 3-2-1, Sakado, Kanagawa, 213-0012 Japan
(Received July 13, 2000; Accepted September 6, 2000)
We report a new fabrication technique of a sub-micron sized probe consisting of functional material on the aperture of a metal coated optical fiber probe tip for near field optical microscopy. The selective flxation of sub-micron size functional material has been achieved by photochemical vapor deposition. Here, we demonstrate for the first time the selective flxation of zinc oxide, a wide gap semiconductor with ultraviolet emission ability, on such probe tips. Results reveal the efficient excitonic emission of 372 nm even at room temperature, which is characteristic of high quality zinc oxide.
Key words : near field optical microscopy, functional probe, photochemical vapor deposition, zinc oxide, excitonic emission