[OPTICAL REVIEW Vol. 10, No. 4 (2003) 233-240]
© 2003 The Optical Society of Japan

The Development of Dioptric Projection Lenses for Deep Ultraviolet Lithography

Willi ULRICH*, Hans-Jurgen ROSTALSKI and Russ HUDYMA1

Carl Zeiss SMT AG, D-73446 Oberkochen, Germany
1Paragon Optics, Inc., San Ramon, CA, USA

(Received December 6, 2002; Accepted June 25, 2003)

Advanced dioptric projection lenses from Carl Zeiss are used in some of the world's most advanced deep ultraviolet projection lithography systems. These lenses provide a resolution of better than 100 nm across the entire field of view with a level of aberration control that maximizes critical dimension uniformity and lithographic process latitude. These dioptric projection lenses are currently being used for critical layer device patterning for a wide array of complex logic, memory, and application specific integrated circuits.

Key words: lens design, dioptric lenses, monochromat, microlithography, microscopy, ultraviolet, aspheres, immersion lithography

*Correspondence: E-mail address: Ulrich@zeiss.de