Tomoyuki MATSUYAMA and Tomoko UJIKE¹

Optical Development Department, Precision Equipment Company, Nikon Corporation, 201-9, Miizugahara, Kumagaya 360-8559, Japan
¹Imaging Technology Development Department, Core Technology Center, Nikon Corporation, 201-9, Miizugahara, Kumagaya 360-8559, Japan

(Received November 20, 2003; Accepted May 11, 2004)

Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.

Key words: aberration functions, Zernike polynomials, orthogonalization, microlithographic lens, wavefront aberration