[OPTICAL REVIEW Vol. 12, No. 4 (2005) 319-323]
© 2005 The Optical Society of Japan

Thickness and Surface Profile Measurement by a Sinusoidal Wavelength-Scanning Interferometer

Hisashi AKIYAMA, Osami SASAKI1 and Takamasa SUZUKI1

Graduate School of Science and Technology, Niigata University, Niigata 950-2181, Japan
1Faculty of Engineering, Niigata University, Niigata 950-2181, Japan

(Received January 6, 2005; Accepted May 27, 2005)

We propose a sinusoidal wavelength-scanning interferometer for measuring thickness and surface profile of a thin film. The interference signal contains phase modulation amplitude Z and phase α which are related to the positions and profiles of the reflecting surfaces, respectively. By reducing the difference between the detected signal and the estimated signal using the multidimensional nonlinear least-squares algorithm, we estimate values of Z and α. Experimental results show that the front and rear surfaces of a silica glass plate of 20 μm-thickness could be measured with an error less than 10 nm.

Key words: interferometer, surface profiles, thickness, wavelength-scanning, sinusoidal phase-modulation

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