[OPTICAL REVIEW Vol. 16, No. 3 (2009) 274-275]
© 2009 The Optical Society of Japan
Refractive Index Variation of Amorphous Ta2O5 Film Fabricated by Ion Beam Sputtering with RF Bias Power
Chen Yang HUANG1,2, Hao Min KU1, Yi Ping TSAI1, Wei Kai CHEN1, and Shiuh CHAO1,*
1Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
2Industrial Technology Research Institute, Chutung, Hsinchu, Taiwan 31040, R.O.C.
(Received October 22, 2008; Accepted March 3, 2009)
Ta2O5 film was fabricated by ion beam sputtering with RF bias applied to the substrate. The refractive index in the visible range of the film can be controlled to vary linearly with the RF bias power while low absorption is maintained.
Key words: tantalum pentoxide, ion beam sputtering, RF bias power, refractive index
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