[OPTICAL REVIEW Vol. 16, No. 3 (2009) 396-399]
© 2009 The Optical Society of Japan

Effects of Thermal Annealing on Titanium Oxide Films Prepared by Ion-Assisted Deposition

Cheng-Chung JAING*, Hsi-Chao CHEN1, and Cheng-Chung LEE2

Department of Optoelectronic System Engineering/Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu 304, Taiwan
1Department of Electro-Optical Engineering, De Lin Institute of Technology, Tucheng 236, Taiwan
2Department of Optics and Photonics/Thin Film Technology Center, National Central University, Chungli 320, Taiwan

(Received July 9, 2008; Accepted January 29, 2009)

Titanium oxide thin films are prepared at a substrate temperature of 250 °C by electron-beam evaporation and ion-assisted deposition. The effects of thermal annealing temperatures from 100 to 450 °C on the optical and mechanical properties are studied. The optical and mechanical properties include refractive indices, extinction coefficients, residual stress, surface roughness and crystallization. Experimental results show these properties of titanium oxide films clearly depend on the thermal annealing process.

Key words: Titanium oxide films, substrate temperature, ion-assisted deposition, thermal annealing, optical properties, mechanical properties

*E-mail address: ccjaing@must.edu.tw