[OPTICAL REVIEW Vol. 16, No. 3 (2009) 400-403]
© 2009 The Optical Society of Japan
Optical Properties of High Transmittance Aluminum Oxynitride Thin Films for Spectral Range from Near Ultraviolet to Visible
Yung-Hsin LIN1*, Jin-Cherng HSU2, Yi DING1,3, and Paul W. WANG1,4
1Graduate Institute of Applied Science and Engineering, Fu-Jen Catholic University, Taiwan
2Department of Physics, Fu-Jen Catholic University, Taiwan
3The Teaching Center of Natural Sciences, College of Humanities, Social and Natural Sciences, Minghsin University of Science and Technology, Hsinchu, Taiwan
4Department of Physics, Bradley University, Peoria, IL61625, U.S.A.
(Received July 15, 2008; Accepted March 13, 2009)
In this study, high transmittance aluminum oxynitride films were deposited by ion beam sputtering at room temperature. The nitrogen working gas was fed into the ion source and the oxygen gas fed near the sputtered target. The properties of the aluminum oxynitride films were examined by a Varian Cary-5E spectrometer, atomic force microscopy, X-ray diffraction and Fourier transform infrared spectroscope. The films show high transmittance at near UV and visible light regions. The optical constants of the films, refractive index and extinction coefficient, can be controlled by varying the oxygen partial pressure.
Key words: aluminum oxynitride, ion beam sputtering, room temperature, and optical constants
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