[OPTICAL REVIEW Vol. 18, No. 1 (2011) 72-75]
© 2011 The Japan Society of Applied Physics
Enlarging Lens Design with F-Θ Lens for Real Time Laser Lithography Inspections
Kuang-Lung HUANG*, Mei CHU, Cheng-Huan CHEN1, Yu-Chung LIN2, Min-Kai LEE2, and Sung-Ho LIU2
Department of Electro-Optical and Energy Engineering, Ming Dao University, Changhua, Taiwan 52345, R.O.C.
1Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
2Laser Application Technology Center, ITRI South, Industrial Technology Research Institute, Tainan, Taiwan 73445, R.O.C.
(Received May 31, 2010; Accepted November 1, 2010)
An enlarging lens, composed of a charge-coupled-device (CCD) lens and an f-Θ lens, has been designed for real time laser lithography visual inspection purposes. The object of this design is to enlarge the image of the working specimens in real time, which used to be done by an independent magnifying system after the lithography process. F-Θ lens has both roles in this design, being a laser lithography lens and a specimen imaging lens. A beam splitter has been inserted between the f-Θ lens and the CCD lens, which divides the UV laser beam and the visible beam to form a coaxial system. This design also reaches the image requirements in both wavelength bands, that the value of MTF is nearly diffraction-limit in UV wavelength and greater than 0.45 at 40 c/mm in visible wavelength.
Key words: lens design, laser lithography, visual inspection
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