[OPTICAL REVIEW Vol. 18, No. 3 (2011) 293-295]
© 2011 The Japan Society of Applied Physics
Aluminium Oxide Optical Film Fabricated with Ion-Assisted Deposition Using Sulphur Hexafluoride and Oxygen Working Gases
Yu-Yun CHEN, Liang-Yu YEN1, Jin-Cherng HSU1*, Huang-Lu CHEN, Paul W. WANG2, and Hsiang-Lin LIU3
Graduate Institute of Applied Science and Engineering, Fu-Jen Catholic University, Hsinchuang, New Taipei City 24205, Taiwan
1Department of Physics, Fu-Jen Catholic University, Hsinchuang, New Taipei City 24205, Taiwan
2Department of Physics, Bradley University, Peoria, IL 61625, U.S.A.
3Department of Physics, National Taiwan Normal University, Taipei, Taiwan
(Received May 14, 2010; Revised October 8, 2010; Accepted November 12, 2010)
Al2O3 thin films fabricated by electron-beam evaporation with ion-assisted deposition at room temperature using O2 or SF6, or their mixture as a working gas were investigated. A significant 20% packing density increase and a low extinction coefficient were obtained when only SF6 was used.
Key words: Al2O3, ion-assisted deposition, optical properties, packing density, SF6
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